2 research outputs found
Large negative photoresistivity in amorphous NdNiO₃ film
Abstract
A significant decrease in resistivity by 55% under blue lighting with ~0.4 J·mm⁻² energy density is demonstrated in amorphous film of metal-insulator NdNiO₃ at room temperature. This large negative photoresistivity contrasts with a small positive photoresistivity of 8% in epitaxial NdNiO₃ film under the same illumination conditions. The magnitude of the photoresistivity rises with the increasing power density or decreasing wavelength of light. By combining the analysis of the observed photoresistive effect with optical absorption and the resistivity of the films as a function of temperature, it is shown that photo-stimulated heating determines the photoresistivity in both types of films. Because amorphous films can be easily grown on a wide range of substrates, the demonstrated large photo(thermo)resistivity in such films is attractive for potential applications, e.g., thermal photodetectors and thermistors
Low-temperature NIR-VUV optical constants of (001) LaAlO3 crystal
Abstract
The optical constants and dielectric function of (001) LaAlO3 crystal were investigated at low temperatures down to 10 K in the NIR-VUV spectral range (photon energies 0.8–8.8 eV). Reflection variable angle spectroscopic ellipsometry and transmission spectroscopy were applied. Interband transitions were examined using the Tauc plots and the critical-point analysis. At room temperature, the indirect bandgap of 5.6 ± 0.01 eV and the lowest-energy direct transition at 7.2 ± 0.03 eV were detected. On cooling to 10 K, a blueshift of ∼0.2 eV and ∼0.1 eV was observed for the indirect and direct transitions, respectively. In the transparency spectral range, the index of refraction was found to be nearly temperature-independent and vary with photon energy from 2.0 (1 eV) to 2.5 (5.5 eV). It was suggested that the excellent thermal stability of the index of refraction may be related to the revealed thermally stable interband transitions. The results are of importance for modeling and design of modern optical devices